Kyoto, Japan

Kazuya Nagase


Average Co-Inventor Count = 5.8

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Kawanishi, JP (2013 - 2015)
  • Kyoto, JP (2019 - 2020)

Company Filing History:


Years Active: 2013-2020

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5 patents (USPTO):Explore Patents

Title: Kazuya Nagase: Innovator in Semiconductor Technology and Dielectric Elastomers

Introduction

Kazuya Nagase is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the fields of semiconductor devices and dielectric elastomer technologies. With a total of five patents to his name, Nagase's work reflects his innovative spirit and dedication to advancing technology.

Latest Patents

Nagase's latest patents include a groundbreaking semiconductor device and its manufacturing method. This semiconductor device features a back barrier layer made of AlGaN, an electron transit layer of AlInGaN, and a top barrier layer also composed of AlGaN. The design incorporates an electron supply layer with an opening that exposes the top barrier layer, facilitating the formation of a two-dimensional electron gas region. Additionally, he has developed a dielectric elastomer driving mechanism, which consists of a driver, a follower, and a power transmitter. This mechanism utilizes a dielectric elastomer layer sandwiched between two electrode layers, allowing for efficient movement and actuation.

Career Highlights

Throughout his career, Kazuya Nagase has worked with esteemed organizations such as Rohm Co., Ltd. and Kyoto University. His experience in these institutions has allowed him to collaborate with leading experts in the field and contribute to cutting-edge research and development.

Collaborations

Nagase has collaborated with notable colleagues, including Susumu Noda

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