Yamanashi, Japan

Kazuya Kato

USPTO Granted Patents = 5 

Average Co-Inventor Count = 3.2

ph-index = 2

Forward Citations = 46(Granted Patents)


Location History:

  • Yamanshi, JP (2005)
  • Nirasaki, JP (2007)
  • Yamanashi, JP (2007)
  • Miyagi, JP (2017)

Company Filing History:


Years Active: 2005-2025

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5 patents (USPTO):Explore Patents

Title: Kazuya Kato: Innovator in Plasma Processing Technology

Introduction

Kazuya Kato is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 5 patents. His innovative approaches have advanced methods for substrate cleaning and processing, showcasing his expertise in the industry.

Latest Patents

Kato's latest patents include a cleaning method and a plasma processing apparatus. The cleaning method involves providing a substrate with a low-k layer containing silicon to a substrate support. It etches the low-k layer using plasma generated from a first gas, separates the etched substrate from the support, and removes any reaction products attached to the substrate using plasma from a second gas. The second gas comprises a first carbon-containing gas represented by CHF(y≥0, x/z>¼). Additionally, his method of processing a target object can suppress surface roughness in both wiring and metal masks. This method generates plasma from a first processing gas containing a fluorocarbon gas and/or a hydrofluorocarbon gas to etch a diffusion barrier film until a copper wiring is exposed. It then generates plasma from a second processing gas containing a carbon-containing gas to form an organic film on the surface of the target object.

Career Highlights

Kazuya Kato is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in developing advanced technologies that enhance the efficiency and effectiveness of plasma processing.

Collaborations

Kato has collaborated with notable colleagues, including Masahiro Ogasawara and Katsuhiko Ono. Their combined expertise has contributed to the success of various projects and innovations within the company.

Conclusion

Kazuya Kato's contributions to plasma processing technology and his innovative patents reflect his dedication to advancing the field. His work continues to influence the industry and pave the way for future developments.

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