Kazutugu Aoki

Title: Kazutugu Aoki: Innovator in Plasma Processing Technology

Introduction

Kazutugu Aoki is a notable inventor based in Shiroyama, Japan. He has made significant contributions to the field of semiconductor processing technology. His innovative work has led to the development of advanced apparatuses that enhance the efficiency of substrate processing.

Latest Patents

Kazutugu Aoki holds a patent for a plasma processing apparatus designed for etching in a tunnel-type configuration. This substrate processing apparatus includes a process tube that encloses multiple semiconductor wafers. It features injectors for introducing process gas, a vacuum pump for exhausting the tube, and RF electrodes that generate a high-frequency electric field. The apparatus is equipped with a high-frequency power source, heaters for directly heating the wafers, and a controller to manage the power supplied to the heaters. This invention is pivotal in creating plasmas from process gases, which is essential for semiconductor manufacturing.

Career Highlights

Throughout his career, Aoki has worked with prominent companies in the semiconductor industry. He has been associated with Tokyo Electron Limited and Tokyo Electron Tohoku Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field.

Collaborations

Kazutugu Aoki has collaborated with esteemed colleagues such as Yutaka Shimada and Hitoshi Kato. These partnerships have fostered innovation and have been instrumental in advancing the technology related to semiconductor processing.

Conclusion

Kazutugu Aoki's contributions to plasma processing technology have made a significant impact on the semiconductor industry. His innovative patent and collaborations with industry professionals highlight his role as a key figure in advancing semiconductor manufacturing techniques.