Kazunori Nemoto

Title: Kazunori Nemoto: Innovator in Semiconductor Inspection Technologies

Introduction

Kazunori Nemoto is a prominent inventor based in Akishima, Japan. He has made significant contributions to the field of semiconductor inspection technologies, holding a total of 4 patents. His work focuses on improving the accuracy and efficiency of defect classification and measurement in semiconductor devices.

Latest Patents

One of his latest patents is an inspecting apparatus and method designed for determining measurement results of a dark-field inspection apparatus up to a microscopic area. This system calibrates a dark-field inspection apparatus using a reference wafer with a precisely formed microroughness pattern. The microroughness is measured using an Atomic Force Microscope (AFM), and an expected haze value is derived from this measurement. The actual haze of the reference wafer's surface is then measured, and adjustments are made to ensure that the expected and actual haze values align.

Another notable patent is related to a semiconductor defect classifying method, apparatus, and program. This innovation allows for the efficient classification of defects by accurately determining the overlap between a design layout pattern and the defect itself. By pattern-matching defective images with design layout data, defects can be classified based on their position relative to the design, simplifying the identification of systematic defects.

Career Highlights

Kazunori Nemoto has worked with leading companies in the technology sector, including Hitachi, Ltd. and Hitachi High-Technologies Corporation. His experience in these organizations has contributed to his expertise in semiconductor technologies and inspection methods.

Collaborations

Throughout his career, Nemoto has collaborated with notable professionals in the field, including Hisafumi Iwata and Makoto Ono. These collaborations have further enhanced his contributions to semiconductor inspection technologies.

Conclusion

Kazunori Nemoto's innovative work in semiconductor inspection technologies has led to significant advancements in the field. His patents reflect a commitment to improving measurement accuracy and defect classification, making him a key figure in the industry.