The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 2014
Filed:
Oct. 15, 2009
Kazunori Nemoto, Akishima, JP;
Akira Hamamatsu, Chiba, JP;
Hideo Ota, Yokohama, JP;
Kenji Oka, Hitachinaka, JP;
Takahiro Jingu, Takasaki, JP;
Kazunori Nemoto, Akishima, JP;
Akira Hamamatsu, Chiba, JP;
Hideo Ota, Yokohama, JP;
Kenji Oka, Hitachinaka, JP;
Takahiro Jingu, Takasaki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A system and method for determining measurement results of a dark-field inspection apparatus up to a microscopic area. A dark-field inspection apparatus is calibrated using a reference wafer having microroughness of an irregular asperity pattern accurately formed on a surface, and the microroughness of the surface having an ensured microroughness degree. This microroughness is measured by using an AFM, and an expected haze value is obtained based on the measured value. Then, haze of the surface of the reference wafer is measured by the dark-field inspection apparatus to be inspected to obtain an actually-measured haze value, and a difference between the expected haze value and the actually-measured haze value is obtained. Based on this difference, a haze measurement parameter of the dark-field inspection apparatus is adjusted so that the actually-measured haze value and the expected haze value match each other.