Kyoto, Japan

Kazuki Moriyama



Average Co-Inventor Count = 1.3

ph-index = 1


Company Filing History:


Years Active: 2017-2025

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4 patents (USPTO):Explore Patents

Title: Kazuki Moriyama: Innovator in Polishing Slurry Technology

Introduction

Kazuki Moriyama is a notable inventor based in Kyoto, Japan. He has made significant contributions to the field of polishing slurry technology, holding a total of four patents. His work focuses on enhancing the efficiency and effectiveness of polishing processes, particularly for copper and resin materials.

Latest Patents

Moriyama's latest patents include innovative formulations for polishing slurries. One of his patents describes a polishing slurry designed for polishing copper or copper alloys. This slurry contains abrasives, an organic acid, an oxidizing agent, and alkali. Additionally, it incorporates polycarboxylic acid and alkylbenzenesulfonic acid, with specific concentrations to optimize performance. Another patent outlines a polishing slurry for resin polishing, which includes alumina and silica abrasives. The silica abrasives consist of aggregate particles made up of primary colloidal silica particles, which are smaller than the median size of the alumina abrasives.

Career Highlights

Throughout his career, Moriyama has worked with prominent companies in the industry. He has been associated with Nitta Dupont Incorporated and Rohm and Haas Electronic Materials CMP Holdings, Inc. His experience in these organizations has contributed to his expertise in developing advanced polishing solutions.

Collaborations

Moriyama has collaborated with several professionals in his field, including Allen S. Bulick and Hideaki Nishizawa. These collaborations have further enriched his work and innovation in polishing slurry technology.

Conclusion

Kazuki Moriyama is a distinguished inventor whose work in polishing slurry technology has made a significant impact. His innovative patents and collaborations reflect his commitment to advancing the industry. His contributions continue to influence the effectiveness of polishing processes in various applications.

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