Company Filing History:
Years Active: 2011-2014
Title: Kazuhiro Isa: Innovator in Plasma Processing Technology
Introduction
Kazuhiro Isa is a notable inventor based in Amagasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and reliability of substrate processing apparatuses.
Latest Patents
Kazuhiro Isa's latest patents include a plasma processing apparatus and a method for cleaning treatment chambers in substrate treating apparatuses. The plasma processing apparatus features an electrode embedded in a mounting table, supplied with high-frequency power for biasing. It includes a surface exposed to plasma, made of an aluminum cover that functions as an opposite electrode. This surface is coated with a protective film, preferably a YOfilm. The design incorporates insulating liners to prevent undesirable short-circuits and ensure a stable high-frequency current path. His second patent outlines a cleaning method for a process chamber that involves supplying a gas containing oxygen into the chamber and generating plasma to clean it without exposing the chamber to the atmosphere.
Career Highlights
Kazuhiro Isa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative work has contributed to advancements in plasma processing technologies, which are crucial for the production of semiconductor devices.
Collaborations
Kazuhiro has collaborated with notable colleagues such as Shigenori Ozaki and Hideyuki Noguchi. Their combined expertise has fostered a productive environment for innovation and development in their field.
Conclusion
Kazuhiro Isa's contributions to plasma processing technology exemplify the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to improving the efficiency and reliability of substrate processing, marking him as a significant figure in his field.