The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2011
Filed:
Feb. 17, 2005
Applicants:
Shigenori Ozaki, Amagasaki, JP;
Hideyuki Noguchi, Nirasaki, JP;
Yoshiro Kabe, Amagasaki, JP;
Kazuhiro Isa, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Inventors:
Shigenori Ozaki, Amagasaki, JP;
Hideyuki Noguchi, Nirasaki, JP;
Yoshiro Kabe, Amagasaki, JP;
Kazuhiro Isa, Amagasaki, JP;
Masaru Sasaki, Amagasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C25F 1/00 (2006.01); C25F 3/30 (2006.01); C25F 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a substrate processing apparatus for performing a plasma process on a substrate including a tungsten-containing film, cleaning is performed for a process chamber. This cleaning includes, after the plasma process, supplying a gas containing Ointo the process chamber without setting the process chamber opened to the atmosphere, and generating plasma of the gas to clean the process chamber.