Nirasaki, Japan

Hideyuki Noguchi

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hideyuki Noguchi. Retrieved from https://idiyas.com/inventor/hideyuki-noguchi-96iba3us

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: The Innovations of Hideyuki Noguchi

Introduction

Hideyuki Noguchi is a prominent inventor based in Nirasaki, Japan. He is known for his contributions to the field of substrate processing, particularly in the development of methods that enhance the efficiency of cleaning treatment chambers in substrate treating apparatuses. His innovative approach has led to significant advancements in the industry.

Latest Patents

One of Hideyuki Noguchi's notable patents is titled "Method for cleaning treatment chamber in substrate treating apparatus and method for detecting endpoint of cleaning." This patent focuses on a substrate processing apparatus that performs plasma processes on substrates containing tungsten films. The method involves cleaning the process chamber by supplying a gas containing oxygen into the chamber without exposing it to the atmosphere, followed by generating plasma to effectively clean the chamber.

Career Highlights

Hideyuki Noguchi is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has been instrumental in advancing technologies that improve substrate processing efficiency. With a total of 1 patent, he has made a significant impact in his field.

Collaborations

Throughout his career, Hideyuki has collaborated with notable colleagues such as Shigenori Ozaki and Yoshiro Kabe. These collaborations have fostered innovation and contributed to the development of advanced technologies in substrate processing.

Conclusion

Hideyuki Noguchi's contributions to the field of substrate processing through his innovative patent and work at Tokyo Electron Limited highlight his importance as an inventor. His methods for cleaning treatment chambers have paved the way for advancements in the industry, showcasing the impact of his work on technology and manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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