The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Mar. 30, 2011
Jun Yamashita, Amagasaki, JP;
Kazuhiro Isa, Amagasaki, JP;
Hideo Nakamura, Amagasaki, JP;
Junichi Kitagawa, Amagasaki, JP;
Jun Yamashita, Amagasaki, JP;
Kazuhiro Isa, Amagasaki, JP;
Hideo Nakamura, Amagasaki, JP;
Junichi Kitagawa, Amagasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a plasma processing apparatus wherein an electrode embedded in a mounting table is supplied with high frequency power for biasing. A surface, which is exposed to plasma and is of an aluminum cover functioning as an opposite electrode to the electrode of the mounting table, is coated with a protection film, preferably a YOfilm. A second portion forming an upper side portion of the processing chamber and a first portion forming a lower side portion of the processing container are provided with an insulating upper liner and an insulating lower liner thicker than the upper liner, respectively. Thus, undesirable short-circuits and abnormal electrical discharge are prevented and stable high-frequency current path is formed.