Ibaraki, Japan

Kazuhiro Ando



Average Co-Inventor Count = 4.2

ph-index = 5

Forward Citations = 122(Granted Patents)


Location History:

  • Niigata, JP (1989 - 1992)
  • Ibaraki, JP (1992 - 1995)

Company Filing History:


Years Active: 1989-1995

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7 patents (USPTO):Explore Patents

Title: Kazuhiro Ando: Innovator in Copper Clad Laminate Technology

Introduction

Kazuhiro Ando is a prominent inventor based in Ibaraki, Japan. He has made significant contributions to the field of materials science, particularly in the production of copper clad laminates and multilayered printed circuit boards. With a total of seven patents to his name, Ando's work has had a substantial impact on the electronics industry.

Latest Patents

Ando's latest patents include a process for producing copper clad laminate. This innovative process involves using a copper foil that has undergone chemical oxidation to create a fine roughness on its surface, which is then reduced in a reducing gas atmosphere. Another notable patent is for a process for producing multilayered printed boards. This method utilizes an inner-layer board that has been chemically oxidized to form a finely roughened layer, enhancing the quality and performance of the printed circuit boards.

Career Highlights

Kazuhiro Ando is currently employed at Mitsubishi Gas Chemical Company, Inc., where he continues to develop advanced materials for electronic applications. His expertise in chemical processes and material engineering has positioned him as a key figure in his field.

Collaborations

Ando has collaborated with several talented individuals, including Takamasa Kawakami and Rieko Nakano. These partnerships have fostered innovation and have contributed to the successful development of his patented technologies.

Conclusion

Kazuhiro Ando's contributions to the field of copper clad laminates and multilayered printed circuit boards demonstrate his commitment to innovation and excellence. His work continues to influence the electronics industry, paving the way for future advancements.

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