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For the Inventor, By the Inventor

Kyoto, Japan

Katsushi Yoshioka

This inventor holds 11 USPTO granted patents. Top assignee: Dainippon Screen Mfg. Co., Ltd.. Active years: 1994-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsushi Yoshioka. Retrieved from https://idiyas.com/inventor/katsushi-yoshioka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 90.9

Average Co-Inventor Count = 4.5

ph-index = 10

Forward Citations = 325(Granted Patents)


Company Filing History:

goldMedal11 out of 1,306 
 
Dainippon Screen Mfg. Co., Ltd.
 patents

Years Active: 1994-2006

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11 patents (USPTO):Explore Patents
1. 7105074 - Substrate treating method and apparatus (2006-09-12),
2. 6893171 - Substrate treating apparatus (2005-05-17),
3. 6832863 - Substrate treating apparatus and method (2004-12-21),
4. 6827782 - Chemical treating apparatus (2004-12-07),
5. 6752543 - Substrate processing apparatus (2004-06-22),
6. 6558053 - Substrate processing apparatus (2003-05-06),
7. 6149727 - Substrate processing apparatus (2000-11-21),
8. 5792259 - Substrate processing apparatus and air supply method in substrate (1998-08-11),
9. 5762709 - Substrate spin coating apparatus (1998-06-09),
10. 5677000 - Substrate spin treating method and apparatus (1997-10-14),
11. 5376216 - Device for holding and rotating a substrate (1994-12-27),

Title: Innovations by Katsushi Yoshioka

Introduction

Katsushi Yoshioka is a prominent inventor based in Kyoto, Japan. He has made significant contributions to the field of substrate treating technology, holding a total of 11 patents. His work focuses on improving the efficiency and effectiveness of substrate treatment processes.

Latest Patents

Yoshioka's latest patents include a substrate treating method and apparatus designed to eliminate wasteful consumption of treating solutions. This innovative apparatus delivers the treating solution in a strip form to a substrate from a nozzle that sweeps over the surface. One aspect of his invention involves collecting vessels arranged around a developing cup that collects part of the developer delivered from a nozzle. Another aspect features collecting vessels positioned below the nozzle, which are moved according to the nozzle's position relative to the wafer. Additionally, his substrate treating apparatus enhances throughput by incorporating an antireflection film forming block, a resist film forming block, and a developing block, all equipped with chemical treating modules and a main transport mechanism.

Career Highlights

Yoshioka is associated with Dainippon Screen Mfg. Co., Ltd., a company known for its advancements in manufacturing technology. His work has significantly impacted the efficiency of substrate treatment processes, making him a key figure in the industry.

Collaborations

Some of his notable coworkers include Kenji Sugimoto and Tsuyoshi Mitsuhashi, who have collaborated with him on various projects.

Conclusion

Katsushi Yoshioka's innovative contributions to substrate treating technology have established him as a leading inventor in his field. His patents reflect a commitment to improving industrial processes and enhancing efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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