The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 06, 2003
Filed:
Apr. 18, 2002
Kazuhito Shigemori, Kyoto, JP;
Masakazu Sanada, Kyoto, JP;
Minobu Matsunaga, Kyoto, JP;
Katsushi Yoshioka, Kyoto, JP;
Kenji Sugimoto, Kyoto, JP;
Kaoru Aoki, Kyoto, JP;
Moritaka Yano, Kyoto, JP;
Satoshi Yamamoto, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Takashi Nagao, Kyoto, JP;
Mitsumasa Kodama, Kyoto, JP;
Yukihiko Inagaki, Kyoto, JP;
Yoshihisa Yamada, Kyoto, JP;
Abstract
A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.