The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2005
Filed:
Apr. 16, 2003
Yoshiteru Fukutomi, Kyoto, JP;
Kenji Sugimoto, Kyoto, JP;
Takashi Ito, Kyoto, JP;
Takeo Okamoto, Kyoto, JP;
Yukihiko Inagaki, Kyoto, JP;
Katsushi Yoshioka, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Yoshiteru Fukutomi, Kyoto, JP;
Kenji Sugimoto, Kyoto, JP;
Takashi Ito, Kyoto, JP;
Takeo Okamoto, Kyoto, JP;
Yukihiko Inagaki, Kyoto, JP;
Katsushi Yoshioka, Kyoto, JP;
Tsuyoshi Mitsuhashi, Kyoto, JP;
Abstract
A substrate treating apparatus disclosed herein realizes improved throughput. The substrate treating apparatus according to this invention includes an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition. Each block includes chemical treating modules, heat-treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block. Transfer of the substrates between adjacent blocks is carried out through substrate rests. The main transport mechanism of each block is not affected by movement of the main transport mechanisms of the adjoining blocks. Consequently, the substrates may be transported efficiently to improve the throughput of the substrate treating apparatus.