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For the Inventor, By the Inventor

San Jose, CA, United States of America

Katsumasa Kawasaki

This inventor holds 19 USPTO granted patents and 2 published patent applications, primarily in Plasma Processing Technology. Top assignee: Applied Materials, Inc.. Active years: 2013-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Katsumasa Kawasaki. Retrieved from https://idiyas.com/inventor/katsumasa-kawasaki

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 19 

% Patents Active = 94.7

Average Co-Inventor Count = 2.5

ph-index = 7

Forward Citations = 276(Granted Patents)


Location History:

  • Los Gatos, CA (US) (2013 - 2015)
  • San Jose, CA (US) (2016 - 2023)
  • Cupertino, CA (US) (2024)

Company Filing History:

goldMedal19 out of 14,502 
 
Applied Materials, Inc.
 patents

Years Active: 2013-2025

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Areas of Expertise:
Plasma Processing
Substrate Etching
RF Pulsing
Impedance Tuning
Waveform Signals
Variable Frequency Generators
Power Delivery
Synchronized Pulsing
Semiconductor Structures
Smart Tuning
Saw Tooth Wave
Multi-Level Pulsing
19 patents (USPTO):Explore Patents
1. 12482633 - Apparatus and method for delivering a plurality of waveform signals during plasma processing (2025-11-25),
2. 12476081 - Methods and apparatus for processing a substrate (2025-11-18),
3. 12046449 - Methods and apparatus for processing a substrate (2024-07-23),
4. 11694876 - Apparatus and method for delivering a plurality of waveform signals during plasma processing (2023-07-04),
5. 11164723 - Methods and apparatus for etching semiconductor structures (2021-11-02),
6. 10930471 - Methods and apparatus for etching semiconductor structures (2021-02-23),
7. 10854427 - Radio frequency (RF) pulsing impedance tuning with multiplier mode (2020-12-01),
8. 10790126 - Smart RF pulsing tuning using variable frequency generators (2020-09-29),
9. 10593518 - Methods and apparatus for etching semiconductor structures (2020-03-17),
10. 10468233 - RF power delivery regulation for processing substrates (2019-11-05),
11. 10424467 - Smart RF pulsing tuning using variable frequency generators (2019-09-24),
12. 9872373 - Smart multi-level RF pulsing methods (2018-01-16),
13. 9788405 - RF power delivery with approximated saw tooth wave pulsing (2017-10-10),
14. 9754767 - RF pulse reflection reduction for processing substrates (2017-09-05),
15. 9741539 - RF power delivery regulation for processing substrates (2017-08-22),

Title: The Innovative Journey of Katsumasa Kawasaki

Introduction: Katsumasa Kawasaki, a visionary inventor based in San Jose, CA, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Katsumasa Kawasaki holds several patents in the field of semiconductor technology, including a recent patent for a revolutionary microchip design that enhances processing speed and efficiency.

Career Highlights: With a background in electrical engineering, Katsumasa Kawasaki has worked for leading tech companies in Silicon Valley, where he honed his skills in developing cutting-edge solutions for complex technological challenges. His expertise in semiconductor design has led to the creation of several game-changing products that have reshaped the industry.

Collaborations: Throughout his career, Katsumasa Kawasaki has collaborated with top researchers and engineers in the field, fostering a culture of innovation and pushing the boundaries of what is possible in the world of technology. His collaborative spirit has been instrumental in driving forward progress and achieving groundbreaking results.

Conclusion: Katsumasa Kawasaki's relentless pursuit of innovation and his passion for pushing the limits of technology have solidified his reputation as a trailblazer in the field of semiconductor design. His work continues to inspire future generations of inventors and engineers to think boldly and create the technologies of tomorrow.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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