The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2025
Filed:
Oct. 23, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Katsumasa Kawasaki, Los Gatos, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Yue Guo, Redwood City, CA (US);
Chunlei Zhang, Santa Clara, CA (US);
Sergio Fukuda Shoji, San Jose, CA (US);
Jorge Zaninovich, Santa Clara, CA (US);
Smbat Kartashyan, Santa, CA (US);
Applied Materials Inc., Santa Clara, CA (US);
Abstract
Methods and apparatus for processing a substrate are provided herein. For example, apparatus can include a first voltage/current (V/I) probe configured to connect to an input side of a matching network of the processing chamber and a second V/I probe configured to connect to an output side of the matching network and a processor coupled to the first V/I probe and the second V/I probe and configured to, based on a phase gap between a V and I of an RF signal detected by at least one of the first V/I probe or the second V/I probe at a target frequency, detect a minimum phase gap between the V and I, and control at least one of impedance tuning of the matching network or process control of the processing chamber using at least one of a peak or RMS of V, I and phase measured at the target frequency or under sweeping frequency.