Smbat Kartashyan

Title: Smbat Kartashyan: Innovator in RF Power Processing Technologies

Introduction

Smbat Kartashyan is a notable inventor based in Santa Clara, CA, who has made significant contributions to the field of RF power processing technologies. With a total of 2 patents to his name, he has developed innovative methods and apparatus that enhance the efficiency and effectiveness of processing chambers.

Latest Patents

Smbat's latest patents include "Methods and apparatus for processing a substrate" and "Methods and apparatus for supplying RF power to plasma chambers." The first patent focuses on an apparatus that includes a first voltage/current (V/I) probe and a second V/I probe, which work together to detect and control impedance tuning of the matching network in a processing chamber. The second patent addresses the dynamic matching of load impedance between a process chamber and an RF power source, utilizing filtering techniques to ensure optimal performance across a wide range of load impedances.

Career Highlights

Smbat Kartashyan is currently employed at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work at Applied Materials has allowed him to apply his innovative ideas in real-world applications, contributing to advancements in technology.

Collaborations

Throughout his career, Smbat has collaborated with talented professionals such as Kartik Ramaswamy and David Totedo. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Smbat Kartashyan's contributions to RF power processing technologies demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the complexities involved in processing chambers, and his work continues to influence advancements in the industry.