Katsuhiro Ota

Title: Katsuhiro Ota: Innovator in Semiconductor Technology

Introduction

Katsuhiro Ota is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on improving the reliability and efficiency of semiconductor apparatuses.

Latest Patents

One of Ota's latest patents is a process for semiconductor apparatus that includes forming an insulator and a semiconductor film on the backside of the wafer. This innovative method addresses the issue of dusting from the peripheral end portion of a wafer. By removing the semiconductor film from the entire surface of the backside and the peripheral portion of the wafer through high etching rates, Ota's invention ensures the creation of a semiconductor apparatus with high reliability. Another notable patent involves a polishing slurry that effectively removes abrasive grains adhering to polished surfaces or the interiors of polishing apparatus after use. This slurry is prepared by dispersing abrasive grains in a dispersion medium, enhancing the polishing process.

Career Highlights

Throughout his career, Katsuhiro Ota has worked with leading companies in the semiconductor industry, including Hitachi, Ltd. and Renesas Technology Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.

Collaborations

Ota has collaborated with notable professionals in the field, including Akio Saito and Yoichi Takahara. These collaborations have contributed to the advancement of semiconductor technologies and have fostered a spirit of innovation.

Conclusion

Katsuhiro Ota's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of reliable semiconductor apparatuses, showcasing the importance of innovation in technology.