Location History:
- Briston, GB (2007)
- Bristol, GB (2007)
Company Filing History:
Years Active: 2007
Title: Katherine Giles: Innovator in Film Formation Technologies
Introduction
Katherine Giles is a notable inventor based in Briston, GB, recognized for her contributions to the field of film formation technologies. With a total of two patents to her name, she has made significant advancements in methods and apparatuses for creating films on substrates.
Latest Patents
Her latest patents include a "Method and apparatus for forming a film on a substrate." This invention involves supplying a silicon-containing organic compound and an oxidizing agent in gaseous or vapor form to a chamber, utilizing plasma to deposit a film on the substrate. The method ensures that carbon-containing groups are retained in the film, with particular embodiments achieving this by exposing the film to H-plasma. Another significant patent is for "Forming low k dielectric layers," which describes the process of depositing an unset dielectric layer that includes silicon, carbon, and oxygen on a substrate. The surface of this dielectric layer is then exposed to an activated gas to create a semi-permeable skin, followed by curing to render the layer at least partially porous.
Career Highlights
Katherine has worked with reputable companies such as Aviza Technology Limited and Aviza Europe Limited, where she has applied her expertise in film formation technologies. Her work has contributed to advancements in the semiconductor industry, particularly in the development of low k dielectric materials.
Collaborations
Throughout her career, Katherine has