The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 2007
Filed:
Jun. 26, 2000
Katherine Giles, Briston, GB;
Knut Beekmann, North Somerset, GB;
Christopher David Dobson, Bristol, GB;
John Macneil, Cardiff, GB;
Antony Paul Wilby, Bristol, GB;
Katherine Giles, Briston, GB;
Knut Beekmann, North Somerset, GB;
Christopher David Dobson, Bristol, GB;
John MacNeil, Cardiff, GB;
Antony Paul Wilby, Bristol, GB;
Aviza Europe Limited, Newport, Gwent, GB;
Abstract
This invention relates to a method and apparatus for forming a film on the substrate. The method comprises supplying to the chamber in gaseous or vapor form a silicon containing organic compound and an oxidizing agent in the presence of a plasma to deposit a film on the substrate and setting the film such that carbon containing groups are retained therein. In particular embodiments the setting is achieved by exposing the film to Hplasma.