Company Filing History:
Years Active: 2007
Title: Knut Beekmann: Innovator in Film Formation and Diffusion Barriers
Introduction
Knut Beekmann is a notable inventor based in North Somerset, GB. He has made significant contributions to the field of materials science, particularly in the development of methods for forming films on substrates and creating diffusion barriers. With a total of 2 patents to his name, Beekmann's work has implications for various industries, including electronics and materials engineering.
Latest Patents
Beekmann's latest patents include a "Method and apparatus for forming a film on a substrate." This invention relates to a method that involves supplying a silicon-containing organic compound and an oxidizing agent in gaseous or vapor form to a chamber, in the presence of plasma, to deposit a film on the substrate. The film is set in such a way that carbon-containing groups are retained, with particular embodiments achieving this by exposing the film to Hplasma. Another significant patent is the "Method of forming a diffusion barrier," which limits the diffusion of metals, such as copper, into insulating layers. This barrier is made from a silicon carbide-type material that has been exposed to ionized hydrogen after deposition, preferably containing nitrogen and having a dielectric constant of 3.5 or less.
Career Highlights
Throughout his career, Knut Beekmann has worked with various companies, including Aviza Europe Limited and Aviza Technology Limited. His experience in these organizations has allowed him to refine his skills and contribute to innovative projects in the field of materials science.
Collaborations
Beekmann has collaborated with notable professionals in his field, including Katherine Giles and Christopher David Dobson. These collaborations have likely enriched his work and expanded the impact of his inventions.
Conclusion
Knut Beekmann is a distinguished inventor whose work in film formation and diffusion barriers has made a significant impact in materials science. His innovative patents and collaborations highlight his contributions to the industry.