Katharina Teichmann

Title: Katharina Teichmann: Innovator in Semiconductor Technology

Introduction

Katharina Teichmann is a prominent inventor based in Munich, Germany. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her innovative approaches have paved the way for advancements in electronic devices.

Latest Patents

Teichmann's latest patents include a method for fabricating a semiconductor device using both wet etching and dry etching. This method involves depositing a TiW layer on a semiconductor substrate, followed by a Ti layer, a Ni alloy layer, and an Ag layer. The process includes at least partially covering the Ag layer with photoresist, wet etching the Ag and Ni alloy layers, and dry etching the Ti and TiW layers. Another notable patent is for an electronic module featuring an electrically conductive press-fit terminal with a press-fit section. This electronic assembly allows for mechanical and electrical contact with an electric part through a contact hole, ensuring a robust connection.

Career Highlights

Throughout her career, Katharina Teichmann has worked with leading companies in the semiconductor industry, including Infineon Technologies AG and Infineon Technologies Austria AG. Her work has been instrumental in developing cutting-edge technologies that enhance the performance and reliability of electronic components.

Collaborations

Teichmann has collaborated with notable professionals in her field, including Alexander Herbrandt and Saurabh Roy. These partnerships have contributed to her success and the advancement of semiconductor technologies.

Conclusion

Katharina Teichmann's innovative work in semiconductor technology and her impressive portfolio of patents highlight her as a key figure in the industry. Her contributions continue to influence the development of electronic devices, showcasing her expertise and dedication to innovation.