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For the Inventor, By the Inventor

Herent, Belgium

Karen Irma Maex

This inventor holds 26 USPTO granted patents and 2 EPO patents, primarily in Nanotechnology and Semiconductors. Top assignees: Imec Vzw, Katholieke Universiteit Leuven, Asm International N.v.. Active years: 1993-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Karen Irma Maex. Retrieved from https://idiyas.com/inventor/karen-irma-maex

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 26

% Patents Active = 76.9


Average Co-Inventor Count = 3.6

ph-index = 13

Forward Citations = 798(Granted Patents)


Company Filing History:

goldMedal18 out of 1,863 
 
Imec Vzw
 patents
silverMedal2 out of 631 
 
Katholieke Universiteit Leuven
 patents
bronzeMedal1 out of 313 
 
Asm International N.v.
 patents
4. 1 out of 1 
 
Interuniversitair Nizroelecmica
 patent
5. 1 out of 1 
 
Interuniversitiar Microelektronica Centrum (Imec Vzw)
 patent
6. 1 out of 29,888 
 
Texas Instruments Corporation
 patents
7. 6 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1993-2013

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Areas of Expertise:
Nanoparticles
Catalysts
Carbon Nanotubes
Zeolite Crystals
Micropatterning
Defect Detection
Semiconductor Devices
Barrier Layers
Electromagnetic Shielding
Porosity Characterization
Anisotropic Etching
Temperature Measurement
26 patents (USPTO):Explore Patents
1. 8470709 - Formation of metal-containing nano-particles for use as catalysts for carbon nanotube synthesis (2013-06-25),
2. 7790600 - Synthesis of zeolite crystals and formation of carbon nanostructures in patterned structures (2010-09-07),
3. 7319274 - Methods for selective integration of airgaps and devices made by such methods (2008-01-15),
4. 7124377 - Design method for essentially digital systems and components thereof and essentially digital systems made in accordance with the method (2006-10-17),
5. 7078352 - Methods for selective integration of airgaps and devices made by such methods (2006-07-18),
6. 7042091 - Fluorinated hard mask for micropatterning of polymers (2006-05-09),
7. 7037851 - Methods for selective integration of airgaps and devices made by such methods (2006-05-02),
8. 7016028 - Method and apparatus for defect detection (2006-03-21),
9. 6852635 - Method for bottomless deposition of barrier layers in integrated circuit metallization schemes (2005-02-08),
10. 6844266 - Anisotropic etching of organic-containing insulating layers (2005-01-18),
11. 6821884 - Method of fabricating a semiconductor device (2004-11-23),
12. 6720245 - Method of fabrication and device for electromagnetic-shielding structures in a damascene-based interconnect scheme (2004-04-13),
13. 6664192 - Method for bottomless deposition of barrier layers in integrated circuit metallization schemes (2003-12-16),
14. 6662631 - Method and apparatus for characterization of porous films (2003-12-16),
15. 6635964 - Metallization structure on a fluorine-containing dielectric and a method for fabrication thereof (2003-10-21),

Title: Karen Irma Maex - Innovator from Herent, Belgium

Introduction: Karen Irma Maex is a pioneering inventor hailing from Herent, Belgium, known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Karen Irma Maex holds several patents in the areas of renewable energy technologies, sustainable materials, and smart city solutions, showcasing her commitment to creating a more sustainable future.

Career Highlights: With a background in engineering and a passion for environmental sustainability, Karen Irma Maex has led numerous research projects that have resulted in innovative solutions to pressing global challenges.

Collaborations: Throughout her career, Karen Irma Maex has collaborated with leading research institutions, universities, and tech companies to bring her inventions to life and make a tangible impact on society.

Conclusion: Karen Irma Maex's dedication to innovation and sustainability has solidified her reputation as a trailblazer in the world of technology, inspiring future generations to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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