Suwon-si, South Korea

Kap-Soo Lee


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Location History:

  • Seoul, KR (1992)
  • Gyeonggi-do, KR (2007)
  • Suwon-si, KR (2021)

Company Filing History:


Years Active: 1992-2021

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3 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Kap-Soo Lee and His Contributions to Substrate Processing

Introduction: Kap-Soo Lee, a distinguished inventor based in Suwon-si, South Korea, has made significant strides in the field of semiconductor technology. With a total of three patents to his name, Lee's work primarily focuses on substrate processing methods and chemical vapor deposition (CVD) metallization processes, which are pivotal in enhancing the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents: Kap-Soo Lee's latest patents illustrate his innovative approach to substrate processing. One of his notable patents describes a substrate processing method that involves a cleaning process performed at a first temperature. This method effectively removes a portion of a cumulative layer deposited within a chamber by various deposition processes. These steps, which alternate repeatedly, optimize the manufacturing process. Another significant patent involves CVD metallization processes and apparatus, specifying methods for forming a barrier metal layer on a semiconductor substrate while cooling it without breaking vacuum. This innovative cooling process takes place within a specially designed cooling chamber, ensuring seamless operations in the production line.

Career Highlights: Throughout his career at Samsung Electronics Co., Ltd., Kap-Soo Lee has demonstrated an unwavering commitment to innovation, driving advancements in semiconductor technologies. His expertise in CVD processes has contributed to improved manufacturing efficiencies, vital for the world of electronics that demands high-performance materials.

Collaborations: In his journey of innovation, Kap-Soo Lee has collaborated with notable colleagues such as Doo-Won Kang and Hyun-Jong Lee. These partnerships have not only enriched Lee's work but have also fostered an environment of shared knowledge and collective advancement in technology.

Conclusion: Kap-Soo Lee's contributions to substrate processing and metallization processes underscore his role as a leading inventor in the semiconductor industry. His patents reflect a dedication to improving manufacturing processes, making significant impacts on technology that affect countless sectors reliant on semiconductor products. As he continues to innovate, the industry awaits what promising advancements he will bring forth in the future.

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