Tokyo, Japan

Kaoru Hamaura

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.7

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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4 patents (USPTO):Explore Patents

Title: Innovations by Kaoru Hamaura

Introduction

Kaoru Hamaura is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of substrate cleaning technology. With a total of 4 patents to his name, Hamaura's work has had a considerable impact on the industry.

Latest Patents

Hamaura's latest patents include a substrate cleaning device, substrate cleaning apparatus, method for manufacturing cleaned substrate, and substrate processing apparatus. The substrate cleaning device features a substrate holding unit designed to hold a substrate. It includes a first cleaning unit with a first cleaning member that comes into contact with a first surface of the substrate to clean it. Additionally, a second cleaning unit with a second cleaning member also cleans the same surface. A controller manages the operation of both cleaning units, ensuring that when one cleaning member is in use, the other is positioned away from the substrate.

Career Highlights

Hamaura is currently employed at Ebara Corporation, a leading company in the field of environmental engineering and equipment. His work at Ebara has allowed him to develop innovative solutions that enhance substrate cleaning processes.

Collaborations

Hamaura has collaborated with notable coworkers, including Takeshi Sakurai and Eiji Hirai. Their combined expertise has contributed to the advancement of substrate cleaning technologies.

Conclusion

Kaoru Hamaura's contributions to substrate cleaning technology through his patents and work at Ebara Corporation highlight his role as an influential inventor in the field. His innovations continue to shape the industry and improve cleaning processes.

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