Company Filing History:
2 out of 33 
1 out of 3 Years Active: 2019-2025
Title: Innovator Spotlight: Kaizhou Tan and His Semiconductor Advances
Introduction: Kaizhou Tan is a notable inventor based in Chongqing, China, recognized for his contributions to the field of semiconductor technology. His innovative patent focuses on improving the efficiency and reliability of power semiconductor devices, showcasing his expertise and commitment to advancing this critical area of electronics.
Latest Patents: Kaizhou Tan holds a patent for a semiconductor cell structure and power semiconductor device. This invention features a highly-doped semiconductor material region, an epitaxial layer, a dielectric insulating layer, a semi-insulating material, and an active device region. A significant aspect of his innovation is a deep groove etched into the epitaxial layer, vertically extending into the highly-doped semiconductor material region. This design allows for the dielectric insulating layer to be formed on the inner side wall of the deep groove, which is then filled with a semi-insulating material. The improvements in this cell structure significantly reduce process implementation difficulties, broaden the tolerance of charge mismatch, and enhance the long-term reliability of the device’s operation.
Career Highlights: Kaizhou Tan is affiliated with the 24th Research Institute of China Electronics Technology Group Corporation, where he conducts cutting-edge research in semiconductor technology. His work focuses on developing solutions that are not only innovative but also practical for real-world applications.
Collaborations: Throughout his career, Tan has collaborated with talented associates, including Gangyi Hu and Zhaohuan Tang. Together, they contribute to advancing the field of electronics through their combined expertise and innovative efforts.
Conclusion: Kaizhou Tan’s work exemplifies the strides being made in semiconductor technology. His patent highlights not only his ingenuity but also his dedication to improving device performance and reliability. As he continues to contribute to the field, his work will likely inspire further innovations in semiconductor solutions.