Kaiwen Xu

Title: Innovations by Inventor Kaiwen Xu

Introduction

Kaiwen Xu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. With a total of 2 patents, his work focuses on enhancing the visualization and inspection of three-dimensional semiconductor structures.

Latest Patents

One of his latest patents involves the visualization of three-dimensional semiconductor structures. This innovative semiconductor metrology tool inspects an area of a semiconductor wafer. The inspected area includes multiple instances of a 3D semiconductor structure arranged periodically in at least one dimension. A computer system generates a model of each instance of the 3D semiconductor structure based on measurements collected during the inspection. The computer system then renders an augmented-reality or virtual-reality (AR/VR) image of the model, showcasing its 3D shape. This AR/VR image is provided to an AR/VR viewing device for display. Another patent also focuses on the visualization of three-dimensional semiconductor structures, utilizing a similar inspection method and model generation process.

Career Highlights

Kaiwen Xu is currently employed at Kla Corporation, where he continues to develop innovative solutions in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor inspection tools.

Collaborations

Some of his notable coworkers include Aaron J. Rosenberg and Jonathan Iloreta. Their collaborative efforts contribute to the innovative environment at Kla Corporation.

Conclusion

Kaiwen Xu's contributions to semiconductor technology through his patents and work at Kla Corporation highlight his role as a leading inventor in the field. His innovations are paving the way for advancements in semiconductor inspection and visualization.