Kai-Qiang Wen

Title: Innovations by Kai-Qiang Wen

Introduction

Kai-Qiang Wen is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique semiconductor device and method.

Latest Patents

Kai-Qiang Wen holds a patent for a semiconductor device and method. This patent describes a method that includes forming a fin protruding from a substrate. It involves implanting an n-type dopant in the fin to create an n-type channel region, as well as implanting a p-type dopant to form a p-type channel region adjacent to the n-type channel region. The process also includes forming gate structures over the respective channel regions and creating epitaxial regions in the fin adjacent to these structures.

Career Highlights

Kai-Qiang Wen is currently employed at Taiwan Semiconductor Manufacturing Company Limited. His work at this leading semiconductor manufacturer has allowed him to be at the forefront of technological advancements in the industry. His expertise in semiconductor devices has been instrumental in the development of innovative solutions.

Collaborations

Throughout his career, Kai-Qiang Wen has collaborated with esteemed colleagues such as Shih-Fen Huang and Shih-Chun Fu. These collaborations have fostered a productive environment for innovation and have contributed to the success of various projects within the company.

Conclusion

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