Taipei, Taiwan

Kai-Chieh Yang

USPTO Granted Patents = 5 

Average Co-Inventor Count = 5.2

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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5 patents (USPTO):

Title: Innovations of Inventor Kai-Chieh Yang

Introduction

Kai-Chieh Yang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor device structures, holding a total of 5 patents. His work focuses on innovative methods that enhance the efficiency and functionality of semiconductor devices.

Latest Patents

One of his latest patents involves methods of forming semiconductor device structures. This method includes forming a contact opening in an interlayer dielectric (ILD) layer over an epitaxy source/drain region and creating a metal layer within the contact opening. The metal layer consists of top portions, side portions, and a bottom portion, with a defined space between the top portions. The process further includes a gradient metal removal to enlarge the space, forming a sacrificial layer, and subsequently creating a bulk metal layer on the bottom portion of the metal layer. Another notable patent describes a method for forming contact features of semiconductor devices. This method involves forming a dielectric layer over an epitaxial source/drain region, creating an opening that exposes part of the region, and filling the opening with a conductive material in a bottom-up manner.

Career Highlights

Kai-Chieh Yang has worked with leading companies in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and Foxconn (Kunshan) Computer Connector Co., Ltd. His experience in these organizations has allowed him to develop and refine his innovative techniques in semiconductor technology.

Collaborations

Throughout his career, Yang has collaborated with talented individuals such as Yu-Ting Wen and Yu-Chen Ko. These collaborations have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Kai-Chieh Yang's contributions to semiconductor technology through his innovative patents and collaborations highlight his importance in the field. His work continues to influence the development of advanced semiconductor devices.

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