Hsinchu, Taiwan

Jyh-Shyang Wang

USPTO Granted Patents = 3 

Average Co-Inventor Count = 4.6

ph-index = 2

Forward Citations = 15(Granted Patents)


Location History:

  • Taoyuan, TW (2006)
  • Hsinchu, TW (2006 - 2007)

Company Filing History:


Years Active: 2006-2007

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3 patents (USPTO):Explore Patents

Title: Innovations of Jyh-Shyang Wang

Introduction

Jyh-Shyang Wang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of vertical-cavity surface-emitting lasers (VCSELs) and edge-emitting lasers. With a total of 3 patents to his name, his work has advanced the capabilities of laser technology.

Latest Patents

One of his latest patents is focused on a fabrication method for VCSELs. This method involves forming a contact electrode on a VCSEL within a resonance cavity. A heavily doped layer is created in the resonance cavity where the light intensity is at its weakest. The process includes etching a Bragg reflector while ensuring the etching stop point is above the heavily doped layer. This innovative approach allows for the formation of a contact electrode on the VCSEL structure without requiring high etching precision.

Another notable patent is for an edge-emitting laser that produces a circular beam. This invention utilizes a low-carrier-mobility diluted nitride semiconductor material for the epitaxy light-emitting layer. The use of this material significantly suppresses surface recombination of carriers. The epitaxy structure consists of multiple layers, including a bottom cladding layer, a bottom waveguide layer, a light-emitting layer, an upper waveguide layer, an upper cladding layer, and an electrode contact layer. The light-emitting layer is specifically formed from a diluted nitride material, enhancing the overall performance of the laser.

Career Highlights

Jyh-Shyang Wang is affiliated with the Industrial Technology Research Institute, where he continues to innovate and contribute to advancements in laser technology. His work has been instrumental in pushing the boundaries of what is possible in the field of optics and photonics.

Collaborations

He has collaborated with notable colleagues, including Yi-Tsuo Wu and Nikolai A Maleev, further enriching his research and development efforts.

Conclusion

Jyh-Shyang Wang's contributions to the field of semiconductor technology, particularly through his patents on VCSELs and edge-emitting lasers, highlight his innovative spirit and dedication to advancing laser technology. His work continues to influence the industry and pave the way for future innovations.

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