Hyogo, Japan

Junji Miyazaki


Average Co-Inventor Count = 2.6

ph-index = 11

Forward Citations = 294(Granted Patents)


Location History:

  • both if Itami, JP (1994)
  • Itami, JP (1993 - 1999)
  • Hyogo, JP (1995 - 2000)

Company Filing History:


Years Active: 1993-2000

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18 patents (USPTO):Explore Patents

Title: **Junji Miyazaki: Innovator of Advanced Photomask Technologies**

Introduction

Junji Miyazaki, a prominent inventor based in Hyogo, Japan, has made significant contributions to the field of photomask technology. With a remarkable portfolio of 18 patents, his innovations have advanced the manufacturing processes in the semiconductor industry.

Latest Patents

Miyazaki's latest patents reflect his expertise and creativity in developing advanced solutions. The "Phase shift mask of attenuation type and manufacturing method thereof" patent introduces an auxiliary pattern designed to control exposure light, effectively canceling the intensity of side lobes. This innovation enhances the precision of exposure processes and prevents the generation of high light intensity regions around the light transmitting portion of the phase shift mask.

Another notable patent, "Phase-shifting photomask blank and method of manufacturing the same," outlines a unique manufacturing technique. This process involves sputtering a target of molybdenum silicide in a specific gas mixture, resulting in a nitrided-oxide film formed on a transparent substrate. By subjecting the substrate to heat treatment, this patent paves the way for improved phase-shifting films crucial to photomask technology.

Career Highlights

Throughout his career, Junji Miyazaki has been associated with notable companies such as Mitsubishi Denki Kabushiki Kaisha and Ulvac Coating Corporation. His work in these organizations has been instrumental in driving innovations and enhancing the technological capabilities of photomask manufacturing.

Collaborations

Miyazaki has collaborated with esteemed individuals in the field, including Nobuyuki Yoshioka and Akihiko Isao. These partnerships have facilitated knowledge exchange and fostered an environment for innovative thinking, contributing to the advancements in photomask technologies.

Conclusion

Junji Miyazaki’s contributions to innovative photomask technologies underscore his status as a leading inventor in the semiconductor industry. His patents not only reflect his technical acumen but also demonstrate his commitment to advancing manufacturing methodologies. Through collaboration and a focus on innovation, Miyazaki continues to shape the future of technology in his field.

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