Niigata, Japan

Junichi Okada

USPTO Granted Patents = 11 

 

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1994-2022

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11 patents (USPTO):Explore Patents

Title: Junichi Okada: Innovator in Polycrystalline Silicon Production

Introduction

Junichi Okada is a prominent inventor based in Niigata, Japan, known for his significant contributions to the field of polycrystalline silicon production. With a total of 11 patents to his name, Okada has made remarkable advancements that enhance the quality and efficiency of silicon materials used in various applications.

Latest Patents

One of Okada's latest patents focuses on a process for producing a clean and high-purity polycrystalline silicon mass. This innovative method allows for the removal of heavy metal impurities, such as chromium, iron, nickel, copper, and cobalt, which can adversely affect the quality of single-crystal silicon. By extracting a polycrystalline silicon rod and removing a specific portion from the electrode side, Okada's process ensures that the remaining material has significantly lower concentrations of these impurities. Additionally, he has developed methods for evaluating polycrystalline silicon rods, which include defining novel evaluation values that assess the homogeneity of crystal characteristics in the growth direction.

Career Highlights

Throughout his career, Junichi Okada has worked with notable companies, including Shin-Etsu Chemical Co., Ltd. and Shin-Etsu Handotai Co., Ltd. His work in these organizations has contributed to advancements in silicon production technologies, making him a key figure in the industry.

Collaborations

Okada has collaborated with esteemed colleagues such as Shigeyoshi Netsu and Shuichi Miyao. These partnerships have fostered innovation and have played a crucial role in the development of new technologies in the field of silicon production.

Conclusion

Junichi Okada's contributions to the field of polycrystalline silicon production are invaluable. His innovative patents and collaborations have significantly advanced the quality and efficiency of silicon materials, solidifying his reputation as a leading inventor in this domain.

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