Company Filing History:
Years Active: 2013-2020
Title: Innovations of Jungil Ahn
Introduction
Jungil Ahn is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative spirit and technical expertise.
Latest Patents
One of his latest patents is a gas supply unit and substrate processing system. This system includes a process chamber where processes on a substrate are performed. It features a supporting unit to hold the substrate, a gas supply unit with holes designed to deliver process gas onto the substrate, and an exhaust unit to remove the process gas from the chamber. The gas supply part consists of a gas supply region with holes and a gas diffusion region that is free of gas supply holes.
Another notable patent is an apparatus and method for forming semiconductor devices. This apparatus comprises an inner tube surrounded by an outer tube. A plate at the first open end of the inner tube helps reduce pressure variation within the tube. The through-holes on the plate account for 10 to 60 percent of its total area, with a central first through-hole and annularly arranged second through-holes at the edge.
Career Highlights
Jungil Ahn is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
He has collaborated with notable coworkers such as Youngsoo Park and Myeongjin Kim, contributing to a dynamic and innovative work environment.
Conclusion
Jungil Ahn's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence in his field. His work at Samsung Electronics Co., Ltd. continues to influence the industry positively.