The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2020
Filed:
Oct. 10, 2016
Samsung Electronics Co., Ltd., Suwon-si, KR;
Sukjin Chung, Hwaseong-si, KR;
JongCheol Lee, Seoul, KR;
MinHwa Jung, Hwaseong-si, KR;
Jaechul Shin, Suwon-si, KR;
In-Sun Yi, Seoul, KR;
Geunkyu Choi, Hwaseong-si, KR;
Jungil Ahn, Suwon-si, KR;
Seung Han Lee, Pyeongtaek-si, KR;
Jin Pil Heo, Pyeongtaek-si, KR;
Abstract
A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.