Jin Pil Heo

Title: Jin Pil Heo: Innovator in Substrate Processing Technology

Introduction

Jin Pil Heo is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 3 patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing systems.

Latest Patents

One of his latest patents is a gas supply unit and substrate processing system. This innovative system includes a process chamber where processes on a substrate are performed. It features a supporting unit to hold the substrate, a gas supply unit with gas supply holes designed to deliver process gas onto the substrate, and an exhaust unit to remove the process gas from the chamber. The gas supply part is structured with a gas supply region containing the gas supply holes and a gas diffusion region that is free of gas supply holes, positioned between the gas supply region and the exhaust unit. Another significant patent is a substrate processing apparatus and method that allows for the control of deposition of a reactive-metal-containing precursor in an exhaust line, showcasing his expertise in substrate processing technology.

Career Highlights

Jin Pil Heo has worked with prominent companies in the technology sector, including Samsung Electronics and Wonik IPS. His experience in these organizations has contributed to his development as an inventor and innovator in the field.

Collaborations

He has collaborated with talented individuals such as Seung Han Lee and Sukjin Chung, who have also contributed to advancements in substrate processing technology.

Conclusion

Jin Pil Heo's innovative work in substrate processing technology and his contributions through his patents highlight his importance in the field. His collaborations and career experiences further enhance his profile as a leading inventor in this area.