Samsung Electronics Co., Ltd.

Wonik Ips Co., Ltd.

Jin Pil Heo

Seung Han Lee

Jong Cheol Lee

Sukjin Chung

In-Sun Yi

Geunkyu Choi

Jeong Min Lee

JongCheol Lee

Tae Ho Jeon

MinHwa Jung

Jaechul Shin

Byoung Guk Son

Jungil Ahn

Min Hwa Jung

Suk Jin Chung

Jae Chul Shin

A substrate processing system may include a process chamber in which a process on a substrate is performed, a supporting unit in the process chamber to support the substrate, a gas supply unit including a gas supply part with gas supply holes, with the gas supply holes being configured to supply a process gas onto the substrate, and an exhaust unit configured to exhaust the process gas from the process chamber. The gas supply part may include a gas supply region provided with the gas supply holes and a gas diffusion region between the gas supply region and the exhaust unit. The gas diffusion region may be free of the gas supply holes.

Gas supply unit and substrate processing system

Provided are a substrate processing apparatus and a substrate processing method using the same and, more particularly, a substrate processing apparatus capable of controlling deposition of a reactive-metal-containing precursor in an exhaust line, and a substrate processing method using the same.

Substrate processing apparatus and substrate processing method using the same

A gas supply unit includes a base plate, a plurality of gas supply regions protruding from the base plate and arranged on the base plate in a circumferential direction, and a plurality of sidewall trenches alternating with the gas supply regions on the base plate. A distance between opposing surfaces of the base plate increases in a radial direction from a center of the base plate in each of the plurality of sidewall trenches, so each of the plurality of sidewall trenches has a depth that decreases in the radial direction from the center of the base plate.

Gas supply unit and thin film deposition apparatus including the same

Growing community of inventors

Pyeongtaek-si, South Korea

Jin Pil Heo