The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2020
Filed:
Dec. 12, 2017
Applicant:
Wonik Ips Co., Ltd., Pyeongtaek-si, Gyeonggi-do, KR;
Inventors:
Jeong Min Lee, Goyang-si, KR;
Jin Pil Heo, Pyeongtaek-si, KR;
Tae Ho Jeon, Pyeongtaek-si, KR;
Seung Han Lee, Osan-si, KR;
Byoung Guk Son, Osan-si, KR;
Assignee:
WONIK IPS CO., LTD., Pyeongtaek-si, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/4412 (2013.01); C23C 16/455 (2013.01); H01L 21/0228 (2013.01); H01L 21/02181 (2013.01); H01L 21/02183 (2013.01); H01L 21/02186 (2013.01); H01L 21/02189 (2013.01);
Abstract
Provided are a substrate processing apparatus and a substrate processing method using the same and, more particularly, a substrate processing apparatus capable of controlling deposition of a reactive-metal-containing precursor in an exhaust line, and a substrate processing method using the same.