Tae Ho Jeon

Title: Innovations of Tae Ho Jeon

Introduction

Tae Ho Jeon is a notable inventor based in Pyeongtaek-si, South Korea. He has made significant contributions to the field of thin film technology, holding two patents that showcase his expertise and innovative spirit. His work is particularly relevant in industries that require advanced materials and processing techniques.

Latest Patents

Tae Ho Jeon's latest patents include a method for forming thin films and a substrate processing apparatus. The first patent describes a method for forming a thin film, which involves creating a first thin film with specific thickness and crystallinity through an atomic layer deposition process. This process is followed by etching the first thin film to create a second thin film with a reduced thickness. The second patent focuses on a substrate processing apparatus that can control the deposition of a reactive-metal-containing precursor in an exhaust line, along with a corresponding substrate processing method.

Career Highlights

Tae Ho Jeon is currently employed at Wonik IPS Co., Ltd., where he continues to develop innovative solutions in substrate processing and thin film technology. His work has been instrumental in advancing the capabilities of materials used in various applications.

Collaborations

Throughout his career, Tae Ho Jeon has collaborated with talented individuals such as Sang Jun Park and Sang Jin Lee. These collaborations have contributed to the successful development of his patents and innovations.

Conclusion

Tae Ho Jeon's contributions to thin film technology and substrate processing highlight his role as a significant inventor in the field. His patents reflect a commitment to innovation and excellence in material science.