This inventor holds 6 USPTO granted patents. Top assignee: United Microelectronics Corp.. Active years: 2001-2004.
Location History:
- Hsinchu Hsien, TW (2001 - 2004)
- Chu-Pei, TW (2002 - 2004)
Company Filing History:
Years Active: 2001-2004
Title: Jung-Nan Tseng: Innovator in Chemical-Mechanical Polishing Technology
Introduction
Jung-Nan Tseng, an accomplished inventor based in Hsinchu Hsien, Taiwan, has made significant contributions to the field of chemical-mechanical polishing (CMP). With a total of six patents to his name, Tseng has been at the forefront of developing technologies that enhance the efficiency and reliability of CMP processes.
Latest Patents
Among his latest inventions, Tseng has patented a "Pressure Monitoring System for Chemical-Mechanical Polishing." This system facilitates real-time regulation of air streams during the CMP process by monitoring key parameters, including polishing pressure, pressure difference, and deviation from set point pressure differences. This advanced capability helps minimize troubleshooting and improves the overall reliability of the equipment.
Another noteworthy patent by Tseng is the "Pressure Suppression Device for Chemical Mechanical Polishing Machine and Method Thereof." This device ingeniously addresses the challenges of wafer slippage and breakage during polishing by managing the pressure applied to the wafer and polishing pad. The pressure releasing component ensures that the wafer pressure does not exceed the polishing pressure, thereby safeguarding the delicate wafers during the CMP process.
Career Highlights
Jung-Nan Tseng is currently employed at United Microelectronics Corporation, a major player in the semiconductor manufacturing industry. His work at this esteemed company showcases his dedication to advancing CMP technologies and improving fabrication processes. Tseng's innovative solutions demonstrate his ability to address complex engineering challenges, reflecting his expertise in the field.
Collaborations
Throughout his career, Tseng has collaborated with talented coworkers such as Chien-Hsin Lai and Huang-Yi Lin, who contribute valuable skills and insights to their joint projects. These collaborations not only enhance creativity and problem-solving but also play a crucial role in advancing CMP technologies within the semiconductor industry.
Conclusion
Jung-Nan Tseng stands out as a pioneering inventor in the realm of chemical-mechanical polishing technology. His innovative patents, combined with his career at United Microelectronics Corporation and collaborations with skilled colleagues, highlight his impact on the industry. The advancements brought forth by Tseng's inventions are instrumental in ensuring precision and efficiency in semiconductor manufacturing processes.