Cheonan-si, South Korea

Jung-Ig Jeon


Average Co-Inventor Count = 6.2

ph-index = 1

Forward Citations = 38(Granted Patents)


Location History:

  • Chungcheongnam-do, KR (2019)
  • Cheonan-si, KR (2018 - 2020)

Company Filing History:


Years Active: 2018-2020

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3 patents (USPTO):Explore Patents

Title: Innovations of Jung-Ig Jeon

Introduction

Jung-Ig Jeon is a notable inventor based in Cheonan-si, South Korea. He has made significant contributions to the field of magnetic memory devices and etching compositions. With a total of three patents to his name, his work has had a considerable impact on technology and manufacturing processes.

Latest Patents

Jung-Ig Jeon's latest patents include a composition for cleaning magnetic patterns. This composition is designed for cleaning a magnetic pattern and includes a glycol ether-based organic solvent, a decomposing agent that consists of an aliphatic amine, and at least one of a chelating agent or a cleaning accelerator that contains an organic alkaline compound. Notably, this composition is devoid of water. Another significant patent is an etchant composition, which includes a copper ion source, a source of an organic acid ion with one or more carboxyl groups, a fluoride ion source, and various additives for enhancing etching control. This patent also outlines a method for etching multilayered films and preparing display devices.

Career Highlights

Throughout his career, Jung-Ig Jeon has worked with prominent companies such as Samyoung Pure Chemicals Co., Ltd. and Samsung Electronics Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in the industry.

Collaborations

Jung-Ig Jeon has collaborated with talented individuals, including Ho-Young Kim and Jin-Hye Bae. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Jung-Ig Jeon is a distinguished inventor whose work in magnetic memory devices and etching compositions has made a lasting impact on technology. His innovative patents and collaborations highlight his significant contributions to the field.

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