Samyoung Pure Chemicals Co., Ltd.

Samsung Electronics Co., Ltd.

Samsung Display Co., Ltd.

Mitsubishi Gas Chemical Company, Inc.

Jung-Ig Jeon

Hoon Hee Han

Won-Jun Lee

Ho-Young Kim

Jin-Hye Bae

Chang-Kyu Lee

Geun-Joo Baek

Hyun-Eok Shin

Mi-Soon Lee

Joon-Woo Bae

Chi-Sung Ihn

A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

Composition for cleaning magnetic patterns

Embodiments provide an etchant composition including (A) a copper ion source, (B) a source of an organic acid ion having one or more carboxyl groups in a molecule, (C) a fluoride ion source, (D) an etching controller, a surface oxidizing power enhancer or a combination thereof as a first additive, and (E) a surfactant as a second additive; a method for etching a multilayered film; and a method for preparing a display device.

Etchant composition, method for etching multilayered film, and method for preparing display device

Method of forming magnetic patterns, and method of manufacturing magnetic memory devices

Growing community of inventors

Cheonan-si, South Korea

Jung-Ig Jeon