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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10833251 B1

PDFFull Text
Date of Patent:
Nov. 10, 2020

Filed:

Aug. 22, 2018

Composition for cleaning magnetic patterns

Applicant:

Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;

Inventors:

Ho-Young Kim, Hwaseong-si, KR;

Jin-Hye Bae, Suwon-si, KR;

Hoon Han, Anyang-si, KR;

Won-Jun Lee, Seoul, KR;

Chang-Kyu Lee, Hwaseong-si, KR;

Geun-Joo Baek, Cheonan-si, KR;

Jung-Ig Jeon, Cheonan-si, KR;

Assignees:

SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;

SAMYOUNG PURE CHEMICALS CO., LTD., Cheonan-si, KR;

Attorney:

Lee IP Law, P.C.

Primary Examiner:

Gregory E Webb

Int. Cl.
CPC ...
C11D 7/50 (2006.01); H01L 43/08 (2006.01); G11C 11/16 (2006.01); H01L 27/22 (2006.01); H01L 43/02 (2006.01); H01L 43/10 (2006.01); H01L 43/12 (2006.01);
U.S. Cl.
CPC ...
H01L 43/08 (2013.01); G11C 11/161 (2013.01); H01L 27/228 (2013.01); H01L 43/02 (2013.01); H01L 43/10 (2013.01); H01L 43/12 (2013.01);
Abstract

A composition for cleaning a magnetic pattern, a method of manufacturing a magnetic memory device, a method of forming a magnetic pattern, and a magnetic memory device, the composition including a glycol ether-based organic solvent; a decomposing agent that includes an aliphatic amine; and at least one of a chelating agent, or a cleaning accelerator that includes an organic alkaline compound, wherein the composition is devoid of water.

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