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For the Inventor, By the Inventor

Suwon, South Korea

Jung-Hun Seo

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2008-2020.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jung-Hun Seo. Retrieved from https://idiyas.com/inventor/jung-hun-seo-nu4v5dv1

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 7 

% Patents Active = 57.1

Average Co-Inventor Count = 4.6

ph-index = 3

Forward Citations = 12(Granted Patents)


Location History:

  • Gyeonggi-do, KR (2008 - 2011)
  • Suwon-si, KR (2010 - 2020)

Company Filing History:

goldMedal7 out of 138,671 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2008-2020

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7 patents (USPTO):Explore Patents
1. 10669631 - Gas injection apparatus and thin film deposition equipment including the same (2020-06-02),
2. 10041172 - Gas injection apparatus and thin film deposition equipment including the same (2018-08-07),
3. 8366827 - Chamber inserts and apparatuses for processing a substrate (2013-02-05),
4. 7902090 - Method of forming a layer on a semiconductor substrate (2011-03-08),
5. 7820244 - Method of forming a layer and method of removing reaction by-products (2010-10-26),
6. 7547632 - Methods of forming metal layers in the fabrication of semiconductor devices (2009-06-16),
7. 7439192 - Method of forming a layer on a semiconductor substrate (2008-10-21),

Title: Innovations of Jung-Hun Seo in Gas Injection Technology

Introduction

Jung-Hun Seo is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of gas injection technology, holding a total of 7 patents. His work primarily focuses on enhancing the efficiency and effectiveness of thin film deposition processes.

Latest Patents

One of Jung-Hun Seo's latest patents is a gas injection apparatus designed to sequentially supply a substrate with at least two kinds of source gases that react with each other in a container. This innovative apparatus includes a base plate, a first gas supply region protruding from the base plate, and a second gas supply region that is adjacent to the first. A trench is defined by the sidewalls of both gas supply regions, which face each other and extend radially on the base plate. This design allows for improved gas distribution and reaction efficiency in thin film deposition equipment.

Career Highlights

Jung-Hun Seo is currently employed at Samsung Electronics Co., Ltd., where he continues to develop cutting-edge technologies in the field of gas injection and thin film deposition. His work has been instrumental in advancing the capabilities of semiconductor manufacturing processes.

Collaborations

Throughout his career, Jung-Hun Seo has collaborated with notable colleagues, including Jin-Gi Hong and Ki-chul Kim. These partnerships have fostered innovation and have contributed to the successful development of various technologies in their field.

Conclusion

Jung-Hun Seo's contributions to gas injection technology and thin film deposition are noteworthy, showcasing his expertise and commitment to innovation. His patents reflect a deep understanding of the complexities involved in these processes, making him a valuable asset in the field of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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