The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Aug. 25, 2015
Ki-chul Kim, Seongnam-si, KR;
Jung-il Ahn, Suwon-si, KR;
Jung-hun Seo, Suwon-si, KR;
Jong-cheol Lee, Seoul, KR;
Kyu-hee Han, Suwon-si, KR;
Seung-han Lee, Qsan-si, KR;
Jin-pil Heo, Pyeongtaek-si, KR;
Ki-Chul Kim, Seongnam-si, KR;
Jung-Il Ahn, Suwon-si, KR;
Jung-Hun Seo, Suwon-si, KR;
Jong-Cheol Lee, Seoul, KR;
Kyu-Hee Han, Suwon-si, KR;
Seung-Han Lee, Qsan-si, KR;
Jin-Pil Heo, Pyeongtaek-si, KR;
Abstract
A gas injection apparatus, which can sequentially supply a substrate with at least two kinds of source gases reacting with each other in a container, and thin film deposition equipment including the gas injection apparatus, are provided. The gas injection apparatus includes a base plate, a first gas supply region protruding from the base plate, a second gas supply region protruding from the base plate and adjacent the first gas supply region, and a trench defined by a sidewall of the first gas supply region and a sidewall of the second gas supply region. The sidewall of the first gas supply region and the sidewall of the second gas supply region face each other and extend in a radial direction on the base plate.