Jung-Il Ahn

Title: Innovations by Jung-Il Ahn

Introduction

Jung-Il Ahn is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of technology, particularly in gas injection apparatus and thin film deposition equipment. With a total of 2 patents, Ahn's work is recognized for its innovative approach to enhancing manufacturing processes.

Latest Patents

Ahn's latest patents include a gas injection apparatus and thin film deposition equipment that incorporates this apparatus. The gas injection apparatus is designed to sequentially supply a substrate with at least two kinds of source gases that react with each other within a container. This innovative design features a base plate, a first gas supply region, a second gas supply region, and a trench defined by the sidewalls of the gas supply regions. The sidewalls face each other and extend radially from the base plate, allowing for efficient gas injection.

Career Highlights

Jung-Il Ahn is currently employed at Samsung Electronics Co., Ltd., where he continues to develop cutting-edge technologies. His work has contributed to advancements in the semiconductor and materials science industries, showcasing his expertise and commitment to innovation.

Collaborations

Ahn has collaborated with notable colleagues, including Ki-chul Kim and Jung-Hun Seo, to further enhance the impact of his inventions. Their combined efforts have led to significant advancements in their respective fields.

Conclusion

Jung-Il Ahn's contributions to technology through his patents and collaborations highlight his role as a leading inventor in the industry. His innovative designs in gas injection apparatus and thin film deposition equipment continue to influence manufacturing processes and technological advancements.