The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Oct. 31, 2006
Jung-hun Seo, Suwon-si, KR;
Jin-gi Hong, Suwon-si, KR;
Yun-ho Choi, Yongin-si, KR;
Hyun-chul Kwun, Hwaseong-si, KR;
Eun-taeck Lee, Suwon-si, KR;
Jin-ho Kim, Seoul, KR;
Jung-Hun Seo, Suwon-si, KR;
Jin-Gi Hong, Suwon-si, KR;
Yun-Ho Choi, Yongin-si, KR;
Hyun-Chul Kwun, Hwaseong-si, KR;
Eun-Taeck Lee, Suwon-si, KR;
Jin-Ho Kim, Seoul, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
In a method of forming a layer, a titanium layer and a titanium nitride layer may be successively formed on a first wafer. By-products adhered to the inside of a chamber during the formation of the titanium nitride layer may be removed from the chamber. Processes of forming the titanium layer, forming the titanium nitride layer, and removing the by-products may be repeated relative to a second wafer.