Busan Metropolitan, South Korea

Jung Hun Kim



Average Co-Inventor Count = 3.9

ph-index = 3

Forward Citations = 41(Granted Patents)


Location History:

  • Busan Metropolitan, KR (2012)
  • Busan, KR (2012 - 2016)
  • Anyang-si, KR (2020)
  • Suwon-si, KR (2019 - 2023)

Company Filing History:


Years Active: 2012-2025

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17 patents (USPTO):Explore Patents

Title: Jung Hun Kim: Innovator in Cerium Oxide Abrasives and Image Sensors

Introduction

Jung Hun Kim is a prominent inventor based in Busan Metropolitan, South Korea. He has made significant contributions to the fields of abrasive materials and image sensor technology. With a total of 17 patents to his name, his work continues to influence various industries.

Latest Patents

One of his latest patents is focused on cerium oxide abrasive particles and a polishing slurry composition. This invention relates to cerium oxide abrasive particles that include an element of cerium and a modifier, which satisfy specific agglomeration ratios derived from the primary and secondary particle sizes. Another notable patent involves an image sensor and its fabrication method. This technology features a color filter on a substrate, with an organic photodiode that includes an electrode insulating layer and a unique arrangement of electrodes and organic photoelectric conversion layers.

Career Highlights

Jung Hun Kim has worked with leading companies in the technology sector, including Samsung Electronics Co., Ltd. and K.C. Tech Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions that address complex challenges in his field.

Collaborations

Throughout his career, Jung Hun Kim has collaborated with talented individuals such as Jae Hwan Kim and Young Ho Rhee. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Jung Hun Kim's contributions to the fields of cerium oxide abrasives and image sensors highlight his innovative spirit and dedication to advancing technology. His work continues to pave the way for future developments in these areas.

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