The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 30, 2025

Filed:

Aug. 29, 2022
Applicant:

Kctech Co., Ltd., Gyeonggi-do, KR;

Inventors:

Jung Hun Kim, Gyeonggi-do, KR;

Jeong Gyu Lee, Gyeonggi-do, KR;

Hyo Jun Jang, Gyeonggi-do, KR;

Assignee:

KCTECH CO., LTD., Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09K 3/14 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1409 (2013.01); C09G 1/02 (2013.01);
Abstract

The present disclosure relates to cerium oxide abrasive particles and a polishing slurry composition, and more particularly, to cerium oxide abrasive particles comprising: an element cerium; and a modifier and satisfying the agglomeration ratios calculated from the relational expressions of the primary particle sizes and the secondary particle sizes, and a polishing slurry composition comprising the same.


Find Patent Forward Citations

Kim, Jung. (2025). Cerium oxide abrasive particles and polishing slurry composition (U.S. Patent No. 12428584). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12428584

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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