Jung Han

Title: Inventor Profile: Jung Han from New Taipei, TW

Introduction

Jung Han is a prominent inventor based in New Taipei, Taiwan, recognized for his innovative contributions to the semiconductor industry. With a total of four patents to his name, Jung’s work has significantly advanced the functionality and efficiency of semiconductor devices.

Latest Patents

Jung Han’s latest patented inventions include two notable semiconductor device designs that incorporate a gate oxide layer. The first patent details a semiconductor device that comprises a semiconductor substrate, a first gate oxide layer with a main portion and a sloping edge portion, along with a source/drain doped region strategically placed adjacent to the gate oxide layer. This design ensures improved compatibility and performance in semiconductor applications. Likewise, the second patent mirrors these innovative elements and emphasizes the manufacturing method correspondingly, showcasing Jung's commitment to enhancing semiconductor technology.

Career Highlights

Currently, Jung is affiliated with United Microelectronics Corporation, a leader in the semiconductor manufacturing arena. His tenure at the company has been marked by substantial advancements in device design, establishing new standards within the industry and propelling technological innovations forward.

Collaborations

Throughout his career, Jung Han has collaborated with esteemed colleagues, including Ming-Chi Li and Chih-Mou Lin. Their collective expertise and innovative ideas have fostered a creative environment that has led to the successful development of advanced semiconductor technologies.

Conclusion

Jung Han's contributions to the field of semiconductor devices are noteworthy, and his ongoing innovations continue to shape the future of technology. With a strong foundation in patent-protected inventions, Jung is set to leave a lasting impact on the industry.