Miao-Li County, Taiwan

Jung-Fang Chang

USPTO Granted Patents = 10 

Average Co-Inventor Count = 2.7

ph-index = 2

Forward Citations = 18(Granted Patents)


Location History:

  • Jhu-Nan, TW (2016 - 2017)
  • Miao-Li County, TW (2014 - 2018)

Company Filing History:


Years Active: 2014-2018

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10 patents (USPTO):Explore Patents

Title: **The Innovative Contributions of Jung-Fang Chang**

Introduction

Jung-Fang Chang is a prominent inventor based in Miao-Li County, Taiwan, recognized for his significant contributions in the field of display technology. With a remarkable portfolio of 10 patents, Chang stands out for his innovative designs and solutions that enhance the functionality and efficiency of display devices.

Latest Patents

Among his latest patents, one notable invention is a sophisticated display device featuring a multilayer structure. This device consists of a substrate, a first conductive layer with a gate, a semiconductor layer, and a second conductive layer that includes a drain and a data line. The design emphasizes a unique configuration where the gate edge is strategically located between the data line and the drain edge, enhancing the device's performance by optimizing the overlapping width of the semiconductor layer.

Another innovative patent by Chang revolves around a thin-film transistor substrate. This substrate comprises a base layer and a semiconductor layer, equipped with source and drain electrodes, along with a gate electrode correlated to the semiconductor layer. The invention delineates distinct regions within the semiconductor layer, each with varying thicknesses, which are crucial for ensuring a seamless operation of the transistor, thereby contributing to advances in display technology.

Career Highlights

Jung-Fang Chang has devoted his career to advancing technology within Innolux Corporation, a leading player in the display industry. His expertise in semiconductor devices and display technologies has led to numerous innovations that push the boundaries of current technology. His dedicated work has not only garnered patents but has also significantly contributed to the evolution of modern display solutions.

Collaborations

Throughout his career, Chang has collaborated with esteemed colleagues such as Hsin-Hung Lin and Ker-Yih Kao. Together, they have worked on multiple projects, fostering a collaborative environment that emphasizes innovation and creativity. These partnerships have played an essential role in expanding the scope and impact of their technological advancements.

Conclusion

Jung-Fang Chang's contributions to display technology through his patents and collaborations exemplify the innovative spirit that drives progress in the tech industry. His work at Innolux Corporation not only enhances the functionality of display devices but also reflects the significant impact of inventors in shaping the future of technology. With a continuing commitment to innovation, Chang is poised to make even greater advancements in the years to come.

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